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MEG-CD, MEG-CDh
Spin Coater ＆ Developer MEG-CD, MEG-CDh
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| Description | Specification |
|---|---|
| Wafer Size | Φ2~8” (Si, GaAs, SIC, LNLT, Sapphire) |
| Transfer Robot | Multi Transfer Unit |
| Process Method | Photo resist coater process, Photo resist developer process Bake (HP, CP, AH, AC, HHP), Chemical supply system Chemical temp control system, T&H control system MEG-CDh (Wafer spin scrubber) |
| Other | Followed Semi Standard |
| OS | MS Windows10 Based, Ether-CAT |
| FA | SECSII, GEM Automation |
| Configuration | 2~4COAT, 2~4DEV, 1C2D, 2C2D, 1S1C2D, 2S2C |
